Spatial ALD, Temporal ALD | Nexusbe Nexus-T-Max High-Efficiency System

Product

Nexus S-Max

Nexus S-Max (Spatial Division ALD)

Spatial Division ALD for Display

High-productivity multi-layer thin-film deposition under vacuum and atmospheric pressure conditions

Equipment Applied to New OLED Display Processes

- Large-area 8.6G process for Display
- Improving OLED power consumption andapplying large-area oxide layers
- 4.5G ALD → 8.6G ALD Scale Up
- Low-damage, high-uniformity IGZO deposition for ultra-large OLED substrates

Spatial ALD, Temporal ALD

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Securing a mass production process for high-quality,
high-uniformity, and low-damage oxide TFT layers via multi-component oxide technology

Spatial ALD for Perovskite Solar Cells (2-in-1 System)

High productivity via simultaneous dual-substrate processing (2-in-1 system)

Application for ETL and Passivation in Perovskite Solar Cells

- Simultaneous supply of two reactants in separate spatial zones
- Excellent thin film uniformity
- High process speed, suitable for large-area batch production

Spatial ALD, Temporal ALD

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Setting New Standards for Next-Generation Perovskite Solar Cell Processing
with Advanced Spatial ALD Technology

Item	Description
Growth Per Cycle [Å/Cycle]	0.8
Cycle Time [sec]	0.85
Deposition Rate [Å/min]	60 ~ 70
Refractive Index	>1.60 (Glass) >1.57 (Si)
Uniformity [%]	<3.2
O/Al Ratio	1.60
Step Coverage [%]	Side : 95 / Bottom : 96
Transmittance [%]	98
WVTR [g/m²·day]	Single Layer	4 × 10⁻³, 5 × 10⁻⁴
WVTR [g/m²·day]	Nano Laminate	<5 × 10⁻⁵
Surface Roughness [RMS: Å]	2.1
Stress [MPa]	+250
Hydrogen Contents [%]	14
Area Density [atoms/cm²]	4.53 × 10¹⁷

Item		Description
Process Type		Thermal Spatial Divide ALD
Glass Size [mm]		730 × 920 (G4.5)
PM Foot Print [mm]		4480 × 3760 × 3T
Area of Foot Print [m²]		≥ 1.5
Ratio of Foot Print		≤ 3
Cycle Time [sec]	200 mm/sec	11.4
	400 mm/sec	6.7
	600 mm/sec	5.1
	800 mm/sec	4.3
GPC [Å/Cycle]		1
Target Thickness [Å]
Process Time [sec / sheet]	200 mm/sec	213.7
Process Time [sec / sheet]	400 mm/sec	125.6